Thermal management solutions in semiconductor packaging hot and getting hotter. Advanced energy akrion amat 0190 amat dps anti static mat aoi asml asymtek baratron boom stand microscope brooks automation canon stepper contact systems dage. View photo gallery view video tutorial download standard operating procedures. It can accommodate substrates ranging from 150 mm diameter wafers down to small pieces. Activate the mechanical mask clamp by pressing on the leaf spring until it contacts the edge of the mask. Standard positive and negative photoresist lithography equipment are available.
This suss ma6 mask aligner is configured with top and backside alignment. All motorized manipulators tsa, bsa and alignment stage are set to the position used. The suss microtec ma6 contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 1 m. Multiphoton multispectral laserscanning microscope lsm 510 meta nlo inverted confocal microscope lsm 700 inverted confocal microscope for live imaging and high sensitivity lsm 710 gaasp 6 dimensional microscope for living cells cell observer. Class100 cleanroom equipment list oklahoma state university. The nfc has both a karl suss ma6 ba6 and a mjb3 infrared aligner for top to bottom alignment of masks to silicon wafers. With almost seventy years of industrial experience, strong scientific curiosity and high quality standards, we drive forward products and processes. Karl suss ma6 duv mask aligner standard operating procedure. Mask aligner ma6 a new system solution the suss microtec ma6 mask aligner is the new benchmark in semiconductor submicron research and 3d microsystem production. If an internal link led you here, you may wish to change the link to point directly to the intended article. We are driven to excellence in all areas of our business by focusing 100% of our efforts on solving customers problems, creating deep and lasting customer. Its very good exposure field uniformity and light intensity control can give submicron image resolution results in vacuum contact mode with proper attention to photolithography process and substrate cleanliness standards.
Usage policies notebook for karl suss ma6 mid deep uv. View realtime stock prices and stock quotes for a full financial overview. Processes developed on the ma ba gen4 series can be. Pdf highresolution, lowcost microsensors for networked. Toggle the mask vacuum on by pressing the enter key. Karl suss ma200 in addition to highquality, preowned tools, we offer system software and hardware performance upgrades to extend the capabilities of existing equipment. Jesse arcamo quality test engineer posey company linkedin. It can produce linespace photoresist images down to 0. The maba gen4 series represents the latest generation of suss microtecs semiautomated mask and bond aligner and introduces a new platform system. The software is loaded and the tool is in its initial state, ready for operation. See the complete profile on linkedin and discover jesses. This disambiguation page lists articles associated with the same title formed as a letternumber combination. View scott trocchias profile on linkedin, the worlds largest professional community. Scott trocchia hardware and embedded systems engineer.
There are two platform types that differ in configuration. We provide parts, parts repair or exchange for obsolete suss microtec karl suss lithography equipment. Refurbished canon mpa canon pla aligner karl suss ma karl suss mjb mask aligner oai perkin elmer quintel system mpa 500 fab 51 canon mpa 600fa 1201 pla 501f 50005 pla 501fa 52006 canon pla 600fa mask aligner 50341 ma 150 50014 ma 46 46 ma 56 50015 ma 6 50016 kalr suss ma 8 51723 mjb 55 59 mjb3 mask aligner 58. Usage policies notebook for karl suss ma6 mid deep uv mask aligner revision date september 2014. Karl suss ma6 sop rev 10 01242017 page 3 of 11 to the left and top of the mask.
Topbottom should be enabled to focus on top substrate, which is the mask plate. Infrastructure centers executive vice president for research. Bs6 stock price yangzijiang shipbuilding holdings ltd. It is very common for our customers, tech support personnel, and software developers to be on conference calls together so we can completely understand the problem at hand. Video of karl suss ma6 mask aligner refurbished by classone equipment. Compact aligner platform for research and lowvolume production. Bs 6346 pvc insulated cables,600v bs 6346 pvc insulated cables,19003300v technical reference bs 6346 cables product list belden equivalent cable bus cable coaxial cable data cable fiber optic cable industrial cable instrumentation cable mining cable power cable railway cable rolling stock cable telephone cable thermocouple cable. Here, we report the development of a prototype device, the rare cell sorter, for isolating and recovering single rare cells from whole blood samples. Karl suss ma6 mask aligner with bsa mask aligners are used in photolithographic processes to transfer a pattern from a mask to a photoresist coating on a substrate. Uv exposure techniques suss ma6 mask alignerbs alignment with. Description the karl suss mask aligner performs high resolution photolithography. The karl suss mask aligner performs high resolution photolithography. The bsa microscope with single and splitfield features. Nanotechnology core facility research resources center.
Suss sb6e substrate bonder birck nanotechnology center. To expose photoresist on a wafer using a photomask overview. The suss microtec mask aligner has become synonymous with superior quality, high alignment accuracy, and sophisticated exposure optics. Based on suss microtecs production proven mask aligner design the ma100150e gen2 enables exceptional process scalability and fast timetomarket for new device designs, while the industry leading throughput of 145 wafers per hour reduces cycle time. Bs6 complete yangzijiang shipbuilding holdings ltd. It is also prepared to handle processes like bond alignment, fusion bonding and smile imprint. Bsm61, selfclinching blind fasteners pennengineering. Furthermore, suss platforms provide the capability of aligning and levelling stamps to substrates, as required by many imprint applications. All contact exposure programs vacuum, hard, soft contact and proximity are provided to print structures far into the submicron region. Usage policies notebook for karl suss ma6 mid deep uv mask. Suss ma6 backside alignment quickstart ucsb nanofab wiki. Suss microtec solutions for imprint lithography are based on manual mask aligner platforms and support a wide range of materials and substrate with sizes up to 200 mm. May, 20 after the exposure to uv light through the windows of a cr mask figure 1b karl suss ma6 mask aligner, karl suss america, waterbury, vt and development, the micropattern was transferred to the pr figure 1c and then to the sin layer at the back side of the wafer by reactive ion etching figure 1d technics pe ii a, plasma equipment. Susstec manual resist spinners suss ma6 ba6 contact aligner ma6 ba6.
If you are looking to buy or sell second hand karl suss, please visit equipmatching. Sep 14, 2015 the development of multielectrode array platforms for large scale recording of neurons is at the forefront of neuroengineering research efforts. Images can be obtained and further analyzed with an image processing software for quantification. Karl suss ma6 mask aligner oai model 800 mba manual optical. In software controlled scan mode, both the tsa and. Suss mask aligner ma6 ba6 sop university of louisville. In addition, facilities in the nanoscale engineering, science and technology nest center of university of dayton are also available to us. Separation distance 0300 um adjustable via software wafer size up to 100 mm, pieces down to 20mmx20mm. The underlying theme behind each quantitative technique is the formulation of an appropriate quantitative model. Equipments the nano electrooptics laboratories and biophotonics laboratory has extensive stateoftheart equipments for our research.
It uses 5 masks system and it can be operated manually. Suss microtec is dedicated to the highprecision reproduction of microstructures. Rare cell isolation and recovery on openchannel microfluidic. In addition to inhouse application laboratories, suss microtec also works in cooperation. Karl suss ma6 mask aligner with bsa oklahoma state.
Karl suss microtech ma150 mask aligner motor pcb 260pc158. The maba gen4 pro series is easy to integrate into production environments and is highly compatible with suss microtec s automated mask aligners. Top side alignments and bask side alignment bsa can be performed. The system utilizes a mercury lamp, but is ideal for iline resist processes. The karl suss ma6 contact aligner system can perform precision mask. Any simulation software for designing photo lithography mask. Karl suss mask aligner mjb3 gigatonanoelectronics centre. Prior to bonding, substrate stacks can be mechanically clamped using a transport fixture. Therefore, a process transfer from development to production is easily made.
Bs6 is listed in the worlds largest and most authoritative dictionary database of abbreviations and acronyms. The exposed photoresist was developed in az mif300. Analysis software and support fcs express analysis software. Here we explain the method using calcein am and ethidium homodimer, which stain live and dead cells in different colors.
The suss microtec sb6e wafer bonder is a universal vacuum substrate bonder for designed for a wide range of microelectromechanical system mems applications. Quantitative methods singapore university of social sciences. Drive bs uscope around until can see alignment marks on your mask plate. Flexibility in optics, exposure and bond capabilities aid configuration. Refurbished canon mpa canon pla aligner karl suss ma karl suss mjb mask aligner oai perkin elmer quintel system mpa 500 fab 51 canon mpa 600fa 1201 pla 501f 50005 pla 501fa 52006 canon pla 600fa mask aligner 50341 ma 150 50014 ma 46 46 ma 56 50015 ma 6 50016 kalr suss ma 8 51723 mjb 55 59 mjb3 mask aligner 58 235 340 60 341 61 552ht 62 660ht 64 907. When stringent demands are made of overlay accuracy, the autoalignment functionality of the standard system can be considerably refined. The refurbishment process includes complete wec head rebuild, clean and lubricate alignment stage and micrometers, all tubing checked and worn old tubing replaced with. Press the lamptest key to finish the filter change and to proceed with the program. Singapore university of social sciences suss is the university of choice for lifelong learning and our mission is to provide lifelong education, equipping learners to serve society. B6 systems designs, engineers, and implements software solutions to support our customers business needs. All contact exposure programs vacuum, hard, soft contact and proximity are provided to. After alignment on the ba 6 the substrate stacks are mechanically.
Currents during two separate simultaneous linetoearth shortcircuits and partial shortcircuit currents flowing through earth. The ability to accurately detect and analyze rare cells in a cell population is critical not only for the study of disease progression but also for next flow cytometry systems in clinical application. This system is located presently on production floor and is available for immediate purchase. The uv lithography tool is the latest fourth generation karl suss ma6 mask aligner, which allows patterning of features with resolution down to approximately 700 nm, and with an alignment accuracy of 250 nm. The semiautomated maba gen4 series offers mask alignment, bond alignment, fusion bonding and uvnil. Pharmacokineticbased multiorgan chip for recapitulating. Find which places are within bs6, which county it is in, and where bs6 is relative to nearby towns and cities.
It offers unsurpassed flexibility in the handling of irregularly shaped substrates of differing thickness, as well as standard size wafers up to 6 in. With the ma100150e gen2 suss microtec has designed a dedicated mask aligner platform for processing high brightness leds hbled on substrates up to 150mm. Anodic bonding ab silicon fusion bonding sfb and thermal compression bonding tcb. This innovative system meets customers needs for precision, reliability and low cost of ownership. Ready for load all motorized manipulators tsa, bsa and alignment stage are set to the position used. The wafer was soft baked at 150c for 1 minute, followed by 90 seconds of uv exposure karl suss ma6 mask aligner and 100c postexposure bake for 1 minute. Minor amendment in the north east corner as this part of the site is now proposed for housing. Enable bsa microscope soft button, which sets the arrow keys to move the backside aligning microscope. This capability is especially useful when making sensors, membranes, and threedimensional structures. The images of the cells during processing and the screenshots of imagej software are shown in fig. Karl suss ma6 ba6 with backside alignment bsa manufacturer. We have maskwafer hardware for 3, 4 and 6 in diameter substrates. Electrochemical camera chip for simultaneous imaging of. This is a prime site adjacent to the m606 motorway, and must be developed in accordance with policy bs e11.
Suss microtec, advanced mask aligner lithography amalith. Karl suss ma6 sop rev 10 01242017 page 1 of 11 karl suss ma6 mask aligner sop safety uv exposure. This tool accepts 4 wafers and can be used for either 435nm or 365nm sensitive photoresists. Key to this work is the development of an electrochemical camera chip, a customdesigned ic fabricated in a 0. View jesse arcamos profile on linkedin, the worlds largest professional community. This data is provided for reference only and without warranty of any kind, expressed or inferred. The two platform types differ in configuration, and consist of the maba gen4 for standard processes and the maba gen4 pro series dedicated to advanced and highend processes. Get it in good focus in high mag, then press the grab image soft button. This system can be used for both positive and negative patterning processes incombination with other equipment within the mprf to create advanced structures as required. Selfcalibrating light source no lamp alignment after lamp exchange, improved light uniformity, telecentric illumination and the possibility of freely shaping the angular spectrum are main advantages. The high energy light produced by the high pressure mercury xenon lamp can cause eye damage and skin burns. Students studying this course will learn the technique of quantitative model formulation and processing, using relevant computer software to.
Mo exposure optics moeo, is a novel mask aligner illumination system for all suss microtec mask aligners. The suss mjb 3 mask aligner is designed for highresolution photolithography in a laboratory or pilot production environment. A stateoftheart facility for interdisciplinary research in nanoscience and applied nanotechnology. A feasibility study of multisite,intracellular recordings. Apr 17, 2020 maruti launches bs vi compliant cng version of alto at rs 4. System can be quoted refurbished with installation worldwide and. Please note that the refurbishment process does not begin until the equipment has been purchased. This allows us to quickly and efficiently come up with a solution. It offers unsurpassed flexibility in the handling of irregularly shaped substrates of differing thickness, as well as standard size wafers up to 6 in diameter. The photo resistcoated wafer was aligned with photomask containing the nanoslits and then exposed to uv light in a karl suss ma6 mask aligner. Karl suss ma6 mask aligner sop university of florida. There is a red colored emergency off switch located on the left of the font panel next to the main power switch. This is a global marketplace for buyers and sellers of used, surplus or refurbished karl suss. Flexible 200mm mask aligner with duv light source karl suss rc8 rc8.
The suss sb6e vac substrate bond aligner is a universal tool for bonding processes for micro electromechanical system applications such as. A singlecell assay for time lapse studies of exosome. With its high precision mask alignment, sophisticated substrate handling for fragile, warped and transparent wafers and its high resolution down to 0. The karl suss ma6 optical lithography system is configured to process four inch or smaller wafers. The maba gen4 series represents the latest generation of suss microtecs semiautomated mask. Karl suss ma6 backside and topside alignment youtube. Ma6 ba6 karl suss maba 6 contact aligner the versitile mask holder allows both round and square plates as masks, and the sample plate. It stands out through its well designed functionality it is an industry standard and a high degree of functional automation. The tool offers a variety of exposure methods with overlay accuracy better than 500 nm. Optical nanospectrometers with nanoimprinted cavities of filter arrays conference paper pdf available july 2010 with 78 reads. Suss maba gen4 series smart fullfield exposure tool semiautomated mask aligner the maba gen4 series represents the latest generation of suss microtecs semiautomated mask and bond aligner introducing a new platform system. Abstract in this paper we describe the use of an excimer laser for fullfield lithography in a mask aligner.
729 276 691 353 207 1317 504 944 392 427 222 1415 824 725 1429 884 155 156 1386 1269 1429 195 604 121 489 69 1047 1134 728 1265 1111 295 372 171 1124 875 1379 47 XML HTML